3701 99 00 Andra

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Taric-nummer (10 siffror)

1

Källor: Tullverket (Tulltaxan), EUR-Lex · cn2026. Ursprungsland, förmånstull och nästa steg ›

Varor som har klassificerats här

Exempel ur EU:s databas över bindande klassificeringsbesked (BKB/BTI). Beskeden gäller bara för sin innehavare och många har löpt ut — se dem som vägledning, inte som beslut för din vara.

• PHOTOMASK BLANK. A PLATE, COVERED WITH A FILM OF CHROMIUM AND COATED WITH A PHOTOSENSITIVE OR ELECTRON-SENSITIVE RESIN.THE PLATE/BLANK IS IMAGED USING LASER WRITING TOOLS WITH BESPOKE CIRCUIT DIAGRAM PATTERNS, THEN PROCESSED USING DEVELOP AND ETCHANT TYPE CHEMICALS TO MAKE A PHOTOMASK. PACKAGING OF THE BLANKS INVOLVES LIGHT SENSITIVE MULTICARRIERS WHICH SIT INSIDE CUSHIONED CARDBOARD CONTAINERS…

  3701 99 00 · GB 2019 · GBBTI504441189

• MASK BLANKS - HIGHLY POLISHED, HIGHLY FLAT GLASS OR SYNTHETIC QUARTZ SUBSTRATE, COATED WITH A THIN FILM OF CHROMIUM OR OTHER ABSORBING MATERIAL AND A PHOTORESIST OR ELECTRON-BEAM RESIST. THE RESIST IS SENSITISED BY UV OR ELECTRON-BEAM RADIATION IN PATTERNS RELATING TO INTEGRATED CIRCUIT DESIGN. SENSITISED RESIST IS DEVELOPED AND THE REVEALED FILM IS ETCHED. AFTER THE REMAINING RESIST IS REMOVED…

  3701 99 00 · GB 2015 · GB502430405

• MASK BLANKS - HIGHLY POLISHED, HIGHLY FLAT GLASS OR SYNTHETIC QUARTZ SUBSTRATE COATED WITH A THIN FILM OF CHROMIUM (OR SIMILAR OPAQUE MATERIAL) AND A PHOTO RESIST OR ELECTRON BEAM RESIST. THE RESIST IS SENSITISED BY U.V OR ELECTRON BEAM RADIATION IN PATTERNS RELATING TO INTEGRATED CIRCUIT DESIGNS, SENSITISED RESIST IS DEVELOPED AND THE REVEALED CHROMIUM IS ETCHED. AFTER THE REMAINING RESIST IS…

  3701 99 00 · GB 2007 · GB116717573

• EMULSIONS ON GLASS SUBSTRATES FOR HOLOGRAPHY. HOLOGRAPHIC PLATES IN TH E FLAT, SENSITISED, UNEXPOSED WITH ANY SIDE NOT EXCEEDING 255MM.

  3701 99 00 · GB 2004 · GB112568780