KN-nummer 3707 90 90 Andra

Taric-nummer (10 siffror): 1

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• PRODUCT :- PHOTO-IMAGEABLE SOLDERMASK. COMPRISES OF A LIGHT SENSITIVE LIQUID PREPARATION USED IN PHOTO LITHOGRAPHIC APPLICATIONS, IN THE MANUFACTURE OF SEMICONDUCTOR MATERIALS 2 PACK COATING SYSTEM. PART 1 IS THE HARDENER AND THE 2ND CALLED THE RESIST. ONE OF THE 2 PARTS WILL CONTAIN A PIGMENT, OFTEN GREEN BUT OCCASIONALLY OTHER COLOURS. EACH PART HAS IT OWN UNIQUE REFERANCE NUMBER BUT THEY ARE…

  3707 90 90 · GB 2019 · GBBTI504409181

• SENSITISING PREPARATION, COMPRISING OF ACRYLATE AND/OR MATHACRYLATE POLYMERS, CONTAINING BY WEIGHT NOT MORE THAN 7% PHOTOSENSITIVE ACID PRECURSORS DISSOLVED IN AN ORGANIC SOLVENT CONTAINING AT LEAST 2-METHOXY-1METHYLETHYL ACETATE.

  3707 90 90 · IE 2017 · IEBTI17NT-14-5908

• PHOTO RESIST USED IN THE PROCESS OF BUILDING COMPUTER CHIPS. THIS PRODUCT IS LIMITED TO USE AS A PHOTORESIST IN SEMICONDUCTOR PHOTOMICROLITHOGRAPHY. CHEMICAL DESCRIPTION - 1-ETHOXY-2-PROPANOL. IT IS A COLOURLESS, ODOURLESS LIQUID.

  3707 90 90 · IE 2017 · IEBTI17NT-14-5596-03

• PHOTO RESIST USED IN THE PROCESS OF BUILDING COMPUTER CHIPS. THIS PRODUCT IS LIMITED TO USE AS A PHOTORESIST IN SEMICONDUCTOR PHOTOMICROLITHOGRAPHY. IT IS A COLOURLESS, ODORLESS LIQUID. CHEMICAL DESCRIPTION - 1-ETHOXY-2-PROPANOL

  3707 90 90 · IE 2017 · IEBTI17NT-14-5596-01

• SENSITISING PREPARATION, COMPRISING OF ACRYLATE AND/OR METHACRYLATE POLYMERS, CONTAINING BY WEIGHT NOT MORE THAN 7% PHOTOSENSITIVE ACID PRECURSORS DISSOLVED IN AN ORGANIC SOLVENT CONTAINING AT LEAST 2-METHOXY-1-METHYLETHYL ACETATE

  3707 90 90 · IE 2016 · IE16NT-14-4394

• ANTI-REFLECTION COATING, CONSISTING OF EITHER A SILOXANE POLYMER OR AN ORGANIC POLYMER HAVING A PHENOLIC HYDROXY GROUP MODIFIED WITH A CHROMOPHORE GROUP, IN THE FORM OF A SOLUTION OF AN ORGANIC SOLVENT CONTAINING EITHER 1-ETHOXY-2-PROPANOL OR 2-METHOXY-1-METHYLETHYL ACETATE CONTAINING BY WEIGHT NOT MORE THAN 10% OF POLYMER

  3707 90 90 · IE 2011 · IE10NT-14-1141-02

• Anti-reflection coating, consisting of an ester based polymer modified with a chromophore group, in the form of a solution of either 2-methoxy-1-propanol, 2-methoxy-1-methylethyl acetate or methyl-2-hydroxyisobutyrate, containing by weight not more than 10% of polymer. Used to improve imaging resolution in the photolithographic process to sensitise silicon discs.

  3707 90 90 · GB 2006 · GB115607392

• Anti-reflective coating consisting of a modified polymer in a solution of organic compounds. Used to improve imaging resolution in the photolithographic process to sensitise silicon discs.

  3707 90 90 · GB 2005 · GB114344211